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Taking a huge LEAP forward in nanotechnology!

Explore a greater range of materials and break through the
boundaries that limit you

Discovering realms of possibilities with Imago

The Nano-revolution, up close

Your partner in nanotechnology

Imago, enabling the nano-revolution. One atom at a time!

Opportunities for people with big imaginations...
about very small things

	LEAP SI SERIES

	LEAP HR SERIES

	MICROTIPS

	LASER PULSING

	IVAS ANALYSIS SOFTWARE

	ELECTROPOINTER

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Imago Products
Imago’s Atom Probe product lines utilize novel and proprietary ion optics to provide our customers with a quantum leap improvement in performance over traditional atom probe microscopy. While atom probe microscopy has long been a productive scientific field of study, it is the advanced ion optics within Imago's products which have led to the rapid growth of the atom probe technique. The LEAP Si and LEAP HR have enabled breakthroughs in every key instrument performance metric -- data rate, mass resolution, lateral and vertical resolution, and Field Of View. Scientists and engineers from diverse disciplines, ranging from semiconductor failure analysis to metallurgy to polymer chemistry, are utilizing Imago Atom Probe microscopes in their work.


The LEAP Si features 175nm field of view and a data rate of 5 million ions per minute.		The LEAP Si series provides fast time to knowledge for microelectronics professionals and other researchers for whom time is of the essence. Key features include: largest field of view, highest data rate, excellent mass resolution, and simplified sample preparation using microtip arrays. With the LEAP Si measurements that would have taken months, or been completely impossible, can be accomplished in a matter of hours. Click here for further information on the LEAP Si series.



The LEAP HR offers the ultimate in mass resolution.		The LEAP HR microscope’s patented Large Angle Reflectron (LAR) design is optimized for ultra-high mass resolution while maintaining a wide field-of-view. This enables elements and isotopes with nearly identical mass-to-charge ratios to be uniquely characterized, a key factor in the analysis of metals and advanced materials. Click here for further information on the LEAP HR series.

Atom Probe Microscopy


The specimen to be studied is formed into a sharp tip using a Focused Ion Beam, electrochemical etching, or some other technique. Each atom in the specimen is then field evaporated as an ion and the position and time of flight is recorded using a microchannel plate. The microchannel plate data is analyzed to provide the three-dimensional position and mass to charge ratio for each atom which comprises the specimen. All elements and isotopes are detected and identified. Atom Probe microscopy is the ultimate microscopy technique, combining the best features of Transmission Electron Microscopy (atomic resolution) with those of Secondary Ion Mass Spectrometry (compositional information). For more information on Atom Probe microscopy including a publication from Review of Scientific Instruments with extensive references, please click here.

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